| Preface to the Second Edition | 5 |
|---|
| Preface to the First Edition | 7 |
|---|
| Contents | 9 |
|---|
| Symbols | 16 |
|---|
| 1 Power Semiconductor Devices—Key Components for Efficient Electrical Energy Conversion Systems | 19 |
|---|
| 1.1 Systems, Power Converters and Power Semiconductor Devices | 19 |
| 1.1.1 Basic Principles of Power Converters | 21 |
| 1.1.2 Types of Power Converters and Selection of Power Devices | 23 |
| 1.2 Operating and Selecting Power Semiconductors | 26 |
| 1.3 Applications of Power Semiconductors | 29 |
| 1.4 Power Electronics for Carbon Emission Reduction | 32 |
| References | 36 |
| 2 Semiconductor Properties | 39 |
|---|
| 2.1 Introduction | 39 |
| 2.2 Crystal Structure | 42 |
| 2.3 Energy Gap and Intrinsic Concentration | 44 |
| 2.4 Energy Band Structure and Particle Properties of Carriers | 49 |
| 2.5 The Doped Semiconductor | 53 |
| 2.6 Current Transport | 63 |
| 2.6.1 Carrier Mobilities and Field Currents | 63 |
| 2.6.2 High-Field Drift Velocities | 70 |
| 2.6.3 Diffusion of Carriers, Current Transport Equations and Einstein Relation | 72 |
| 2.7 Recombination—Generation and Lifetime of Non-equilibrium Carriers | 75 |
| 2.7.1 Intrinsic Recombination Mechanisms | 77 |
| 2.7.2 Recombination at Recombination Centers Including Gold, Platinum and Radiation Defects | 79 |
| 2.8 Impact Ionization | 99 |
| 2.9 Basic Equations of Semiconductor Devices | 106 |
| 2.10 Simple Conclusions | 110 |
| 2.10.1 Temporal and Spatial Decay of a Minority Carrier Concentration | 110 |
| 2.10.2 Temporal and Spatial Decay of a Charge Density | 111 |
| References | 112 |
| 3 pn-Junctions | 118 |
|---|
| 3.1 The pn-Junction in Thermal Equilibrium | 118 |
| 3.1.1 The Abrupt Step Junction | 121 |
| 3.1.2 Graded Junctions | 128 |
| 3.2 Current-Voltage-Characteristics of the pn-Junction | 131 |
| 3.3 Blocking Characteristics and Breakdown of the pn-Junction | 139 |
| 3.3.1 Blocking Current | 139 |
| 3.3.2 Avalanche Multiplication and Breakdown Voltage | 143 |
| 3.3.3 Blocking Capability with Wide-Bandgap Semiconductors | 152 |
| 3.4 Injection Efficiency of Emitter Regions | 154 |
| 3.5 Capacitance of pn-Junctions | 161 |
| References | 164 |
| 4 Introduction to Power Device Technology | 166 |
|---|
| 4.1 Crystal Growth | 166 |
| 4.2 Neutron Transmutation for Adjustment of the Wafer Doping | 168 |
| 4.3 Epitaxial Growth | 171 |
| 4.4 Diffusion | 173 |
| 4.4.1 Diffusion Theory, Impurity Distributions | 174 |
| 4.4.2 Diffusion Constants and Solubility of Dopants | 182 |
| 4.4.3 High Concentration Effects, Diffusion Mechanisms | 185 |
| 4.5 Ion Implantation | 187 |
| 4.6 Oxidation and Masking | 192 |
| 4.7 Edge Terminations | 194 |
| 4.8 Passivation | 199 |
| 4.9 Recombination Centers | 200 |
| 4.10 Radiation-Induced Doping | 206 |
| 4.11 Some Aspects on Technology of GaN Devices | 208 |
| References | 213 |
| 5 pin Diodes | 218 |
|---|
| 5.1 Structure of the pin Diode | 218 |
| 5.2 I–V Characteristic of the pin Diode | 220 |
| 5.3 Design and Blocking Voltage of the pin Diode | 221 |
| 5.4 Forward Conduction Behavior | 227 |
| 5.4.1 Carrier Distribution | 227 |
| 5.4.2 Junction Voltages | 230 |
| 5.4.3 Voltage Drop Across the Middle Region | 232 |
| 5.4.4 Voltage Drop in the Hall Approximation | 233 |
| 5.4.5 Emitter-Recombination, Effective Carrier Lifetime and Forward Characteristic | 235 |
| 5.4.6 Temperature Dependency of the Forward Characteristics | 244 |
| 5.5 Relation Between Stored Charge and Forward Voltage | 245 |
| 5.6 Turn-on Behavior of Power Diodes | 247 |
| 5.7 Reverse-Recovery of Power Diodes | 249 |
| 5.7.1 Definitions | 249 |
| 5.7.2 Reverse-Recovery Related Power Losses | 256 |
| 5.7.3 Reverse Recovery: Charge Dynamic in the Diode | 260 |
| 5.7.4 Fast Diodes with Optimized Reverse-Recovery Behavior | 268 |
| 5.7.4.1 Diodes with a Doping Step in the Low-Doped Layer | 268 |
| 5.7.4.2 Diodes with Anode Structures for Improving the Recovery Behavior | 269 |
| 5.7.4.3 The EMCON-Diode | 271 |
| 5.7.4.4 The CAL-Diode | 273 |
| 5.7.4.5 The Hybrid Diode | 275 |
| 5.7.4.6 The Tandem Diode | 277<
|