| Preface | 5 |
|---|
| Contents | 7 |
|---|
| 1 Introduction to Particle-Beam Formation | 13 |
|---|
| 1.1 Application and Parameters of Intense Charged- Particle Beams | 13 |
| 1.2 Optical Systems of Electron Devices | 16 |
| 1.3 Focusing System of Electron Devices | 21 |
| 1.4 Optical Systems of Particle-Beam Technology | 26 |
| 1.5 Ion Optical Systems | 28 |
| 2 Methods of Fields Calculation | 30 |
|---|
| 2.1 General Equations of Electrostatic Fields | 30 |
| 2.2 Electrostatic Field Calculation. Dirichlet Problem | 31 |
| 2.3 Calculation of Electrostatic Field: Cauchy Problem | 41 |
| 2.4 Computer Calculation of Electrostatic Fields | 47 |
| 2.5 General Equations of Magnetic Field | 54 |
| 2.6 Numerical Calculation of Magnetic Field | 58 |
| 3 Fundamentals of Charged-Particle Motion | 65 |
|---|
| 3.1 Equations of Motion in Newton Form | 65 |
| 3.2 Law of Energy Conservation | 66 |
| 3.3 Lagrange Equations of Motion | 68 |
| 3.4 Hamilton Equations | 69 |
| 3.5 Hamilton Jacobi Equation | 70 |
| 3.6 Equations of Motion in Axially Symmetric Fields | 72 |
| 3.7 Motion in Planar Two-Dimensional Fields | 83 |
| 3.8 Numerical Calculation of Charged- Particle Trajectories | 84 |
| 3.9 Electrostatic Charged-Particle Lenses | 87 |
| 3.10 Magnetic Lenses | 96 |
| 4 Motion of Intense Charged-Particle Beams | 105 |
|---|
| 4.1 Peculiarities of Intense Particle-Beam Motion | 105 |
| 4.2 Simplified Models of Charged-Particle Beams | 108 |
| 4.3 Methods of Solution of Motion Equations | 112 |
| 4.4 Approximate Method of Space-Charge Account | 115 |
| 4.5 Motion of Charge-Beams in Channels Free from External Fields | 117 |
| 4.6 Influence of Residual Gases on Electron- Beam Motion | 120 |
| 4.7 Estimation of Effect of Thermal Electron Velocities | 127 |
| 4.8 Methods of Solution of Self-Consistent Problems | 131 |
| 5 Electron Guns | 134 |
|---|
| 5.1 The Problem of Electron-Beam Formation | 134 |
| 5.2 Guns for Formation of Strip Beams | 135 |
| 5.3 Guns for Solid Axially Symmetric Beams | 142 |
| 5.4 Guns for Formation of Hollow Axisymmetric Beams | 150 |
| 5.5 Electron Guns with Beam-Current Control | 154 |
| 5.6 Principle of Computer-Aided Design of Electron Guns | 160 |
| 6 Electron and Ion Sources with Field and Plasma Emitters | 165 |
|---|
| 6.1 Some Peculiarities of Field and Plasma Emitters | 165 |
| 6.2 Low-Current Field-Emission Guns | 165 |
| 6.3 Multiple-Tip Field-Emission Cathodes | 167 |
| 6.4 High-Current Electron Sources with Explosive Emission | 168 |
| 6.5 Liquid-Metal Emitters | 168 |
| 6.6 Plasma Sources of Charged Particles | 169 |
| 6.7 Extracting of Charge Particles and Beam Forming | 173 |
| 7 Magnetic Focusing Systems | 176 |
|---|
| 7.1 Focusing Systems with Uniform Field | 176 |
| 7.2 Systems of Reversed- and Periodic-Field Focusing | 188 |
| 7.3 Focusing of Hollow Beams in Uniform Field | 195 |
| 7.4 Focusing of Strip Beams | 200 |
| 7.5 Computer-Aided Design of Magnetic Systems | 203 |
| 8 Electrostatic Focusing Systems | 205 |
|---|
| 8.1 Focusing System for Solid Axially Symmetrical Beams | 205 |
| 8.2 Systems for Focusing of Strip Beams | 216 |
| 8.3 Focusing Systems for Hollow Beams | 217 |
| 9 Optical Systems of Technological Installations | 220 |
|---|
| 9.1 Electron Probe of Welding Installation | 220 |
| 9.2 Optical System for Electron-Beam Lithography | 224 |
| 9.3 Ion Probes | 226 |
| 10 Intense Relativistic Charged- Particle Beams | 228 |
|---|
| 10.1 Relativistic Equations of Motion | 228 |
| 10.2 Intense Relativistic Beams in Vacuum Channels | 230 |
| 10.3 Neutralized Relativistic Beams | 237 |
| 10.4 Beam-Motion Computation | 237 |
| 11 Multiple-Beam Electron-Optical Systems | 242 |
|---|
| 11.1 Peculiarities and Application of Multiple Beams | 242 |
| 11.2 Multiple-Beam Guns and Magnetic Systems | 244 |
| 11.3 Peculiarities of Multiple Systems | 248 |
| 11.4 Estimation of Effects of Transverse Fields | 253 |
| 11.5 Analysis of Beam Interaction | 255 |
| 12 Methods of Experimental Investigation of Beams | 260 |
|---|
| 12.1 Classification of Methods | 260 |
| 12.2 The Pin-Hole Chamber Method | 263 |
| 12.3 Application of Modified Pin-Hole Chamber | 266 |
| Appendix | 270 |
|---|
| Emittance and Brightness | 270 |
| References | 274 |
|---|
| Index | 283 |